SEM and Energy Dispersion Spectroscopy
SEM/EDS JEOL 6460LV
- 50-20,000X Mag (5-20kV)
- Backscatter Detector
- LV adjustable (10-270 Pa)
- EDS Oxford
- Elemental Quantification
X-Ray Photo-Electron Spectroscopy / ESCA
XPS PHI 5400
- Mg/Al Anode
- Elemental and Chemical Analysis (>Li)
- Ar Sputtering for depth analysis
Confocal Microscope
Olympus LEXT OSL 4100
- 3D Imagining (405 nm)
- Line and Surface Roughness
- Area/Volume measurements
- Particle Size Measuurements
Atomic Force Microscope
Agilent 5420
- Contact Imaging Surface Morphology/roughness Elastic/Viscoelastic properties
- Intermittent Contact
- Non-Contact
Ellipsometer
Horiba UVISEL
- 1.5 -5.5 eV (220-800nm)
- Film Thicknesses monolayer to microns
- Surface and interracial roughness
- Optical constants (n.k)